15 V, 5.0 µm CMOS, 1 PolySi, 1 Me, not self-aligned gate
15 V, 5.0 µm CMOS, 1 PolySi, 1 Me, not self-aligned gate
Parameter | Meaning |
---|---|
Application, features | Small and medium-scale integration logic IC, VDD < 20 V NMOS: Vtn= 1.1 V, Usd >27 V PMOS: Vtp= -1.0 V, Usd >29 V |
Process Description | Number of masks, pcs. 9 Design rule,µm 5.0 Substrate: Si/P-doped/ n-type/Thk 460/Res 4.5 (100) P-well depth, µm 10 Gate SiO2, Å 950 Interlayer dielectric: medium temp. PSG Channel length: NMOS/PMOS, µm 5/6 space line PolySi,µm 5.5 contacts, µm Ø2 space line Me, µm 8 |
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Tel.: .....(+375 17) 272 3729
......(+375 17) 353 2257
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E-mail: export@integral.by
Tel.: .....(+375 17) 272 3729
......(+375 17) 353 2257
Fax:......(+375 17) 353 2257
E-mail: export@integral.by