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20 V,p-n junction isolation “Bp30С-20” complementary

20 V,p-n junction isolation “Bp30С-20” complementary

Parameter Meaning
Application, features Small and medium-scale integration digital-analogue IC, VDD < 18 V

 

NPN transistor  vertical:

bn=150 Uce=27 V

РNP transistor  lateral:

bр=30 Uсе=35 V

РNP transistor  vertical:

bр=45 Uсе=35 V

РNP Vertical with isolated collector:

bр=80 Uсе=30 V

Capacitors:emitter-base; collector base; Ме-n+;

Ме1-Ме2.

Resistors in layers:

Isolation; Base; Resistor
Process Description Number of masks, pcs.                                                     12-14

Mean design rule,µm                                                              6.0

Substrate:         Si/B-doped/ p-type/ Thk 460/ Res 10/  (111)

Buried layers:                Si/Sb-doped/n-type/Thk 6.0/Res  20;

                                    Si/ B-doped/p-type/Thk 1.95/Res    210;

Epi layer:                       Si/P-doped/ n-type/ Thk 8/ Res     1.5;

Isolation:                                                   p-n junction

p-base depth, µm                                                                    2.0

N+emitter depth, µm                                                               1.7

Emitter size, µm                                                                      7*7

Distance between transistors, µm                                         4

Switching: 

contacts 1, µm                                                                        3*3

space line  Me 1, µm                                                              9.0

contacts  2, µm                                                                       4*4

space line  Me 2, µm                                                           12.0
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