0 V, p-n junction isolation “Bp30-20”
Parameter | Meaning |
---|---|
Application, features | Small and medium-scale integration digital-analogue IC, VDD < 18 V NPN transistor vertical: bn=150 Uce=28 V РNP transistor lateral: bр=35 Uсе=45 V РNP transistor vertical: bр=35 Uсе=45 V I2L gate Capacitors:emitter-base; collector-base; Ме-n+; Ме1-Ме2. Resistors in layers: Isolation; Base; Resistor |
Process Description | Number of masks, pcs. 8-13 Mean design rule,µm 6.0 Substrate: Si/B-doped/ p-type/ Thk 460/ Res 10/ (111) Buried layers: Si/ Sb-doped/ n-type/Thk 6.0/Res 20; Si/ B-doped /p-type/Thk 1.95/Res210; Epi layer: Si/ P-doped/ n-type/ Thk 9/ Res 2.0; Isolation: p-n junction p-base depth, µm 2.2 N+emitter depth, µm 1.7 Emitter size, µm 9*9 Distance between transistors, µm 4 Switching: contacts 1, µm 3*3 space line Me 1, µm 9.0 contacts 2, µm 4*4 space line Me 2, µm 12.0 |
The order, cost and terms of fulfillment of orders for the supply of small-scale batches of products are additionally agreed by the Consumer with the marketing and sales services of OJSC "INTEGRAL" - the management company of the holding "INTEGRAL"
Marketing & Sales Department
Tel.: .....(+375 17) 272 3729
......(+375 17) 353 2257
Fax:......(+375 17) 353 2257
E-mail: export@integral.by
Tel.: .....(+375 17) 272 3729
......(+375 17) 353 2257
Fax:......(+375 17) 353 2257
E-mail: export@integral.by